High rate deposition of functional responsive layer by an original nanosecond-pulsed plasma initiated Chemical Vapour Deposition method at atmospheric pressure (AP-PiCVD)


CALL: 2014

DOMAIN: MS - New Functional and Intelligent Materials and Surfaces


LAST NAME: Choquet




KEYWORDS: CVD, atmospheric plasma process, functional polymer layers, kinetic model, growth deposition mechanism, nanosecond-pulsed discharges, physical and chemical in-situ measurements, surface characterizations

START: 2015-09-01

END: 2018-08-31

WEBSITE: https://www.list.lu/

Submitted Abstract

The chemical synthesis of regular polymeric layers on the surface of a substrate can be performed by Chemical Vapour Deposition (CVD). These organic layers continue to win more recognition in the thin-film industry which historically, has been dominated by inorganic films. For example, there is now the possibility of producing conformal, functional and responsive polymeric surfaces by i-CVD or o-CVD for a diverse set of applications, including biomedical implants, microelectrical and mechanical devices and membrane separation. However, the above-mentioned techniques need to operate under low pressure conditions and this constraint limits their industrial developments for large continuous processing or for their integration into open line systems for the manufacturing of 3D products.The main motivation of Nanopolypulse will be to implement an alternative CVD process operating at atmospheric pressure as a way to synthesize a regular multifunctional polymer layer with high deposition rates. The novel process will be called Plasma initiated Chemical Vapour Deposition (PiCVD). For this, the method will rely on the exploitation of nanosecond-pulsed plasma discharges for the generation of species coupled with a duty cycle comprising between 0.01 and 0.001%. To demonstrate the capabilities of this innovative method, the PiCVD of two vinyl-based monomers will be carried out to deposit very stable multifunctional responsive gradient thin polymer layers. To achieve this objective, a complete study of the growth mechanism will be realized based on the development of in-situ physical and chemical measurements (OES, GC/MS). These results will be correlated to the structure of the polymer films determined by different chemical instruments (NMR, ToF-SIMS, ESR). In parallel, a kinetic model will be developed to examine the reaction mechanisms of PiCVD polymerization and investigate potential similarities with liquid-phase radical polymerization.At the end of the project, it is planned to implement the innovative deposition method on two open atmospheric plasma demonstrators: a “direct” plasma plane-to-plane reactor to deposit on flat product in dynamic mode and an “indirect plasma” jet system suitable for polymer patterning.

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