Low temperature low cost TiO2 atmospheric pressure plasma process

SCHEME: INTER

CALL: 2009

DOMAIN: MS - Materials, Physics and Engineering

FIRST NAME: Patrick

LAST NAME: Choquet

INDUSTRY PARTNERSHIP / PPP: No

INDUSTRY / PPP PARTNER:

HOST INSTITUTION: LIST

KEYWORDS:

START: 2010-04-01

END: 2013-03-31

WEBSITE: https://www.list.lu/

Submitted Abstract

The use of TiO2 thin films is an attractive solution in many fields such as anti-reflective coatings (when combined with SiO2 layers), self-cleaning, sterilization, degradation of organic pollutants in air and water and the production of solar cell panels. It is well known that the anatase phase is suitable for photocatalytic activities and superhydrophilic properties. Its deposition by sol-gel techniques or by CVD and PVD methods was extensively studied for 40 years. However, low pressures deposition techniques are too expensive and too difficult to implement on production lines for low cost applications and sol-gel processes result in a low adhesion of coatings with the substrate and require a heating post-treatment. Therefore, there is a need for a new approach to deposit this material

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