Metal Ink Formulations for Atmospheric-Pressure and Room-Temperature Plasma-Assisted Printing of Conductive Films


CALL: 2017

DOMAIN: MS - Materials, Physics and Engineering


LAST NAME: Choquet




KEYWORDS: cold plasma printing - additive manufacturing - metal-organic inks - metallic coatings - conductive layer - plasma atmospheric pressure

START: 2017-06-05

END: 2017-08-31


Submitted Abstract

The PLASMID project aims to investigate Metal Ink Formulations for the Atmospheric-Pressure and Room-Temperature Plasma-Assisted Printing of Conductive Films andStrengthen the LIST Researchers Understanding on Transition Metal Precursors.The atmospheric-pressure and room-temperature of metallic coatings from a simple andscalable method is an unmet need of the ever growing printed electronics market. With a fewexceptions, conductive ink materials are dispersions of metallic nanoparticles. Nevertheless,these inks required sintering at temperatures limiting their widespread use. In addition, thenanoparticles often clog inkjet printer nozzle upon coating. Metal-organic decomposition(MOD) inks provide an alternative to NPs inks. MOD inks are metal complexes composed ofcoordination, auxiliary and reduction ligands. Reduction ligands are something that provideelectrons to the metal centre upon heating. Sometimes ligands coordinate for stability and itis common for MOD complexes to require an inert atmosphere to prevent oxidation, or areducing atmosphere to aid conversion to metal. Recently, the atmospheric-pressureplasma-enhanced chemical vapour deposition (AP-PECVD) of MOD inks was shown toprovide a simple and scalable method for the atmospheric-pressure and room-temperaturedeposition of silver coatings on printer paper. The development of this technologyencompasses many different scientific fields, with the PLASMID project focussing onorganometallic compounds, as opposed to nanoparticles, for use in MOD inks in an APPECVDprocess. The unique and unprecedented combination of MOD inks with AP-PECVDwill facilitate metallic surfaces, produced on a large scale on a range of substrates atatmospheric pressure and room temperature. Exhaustive surface characterizations will allowa deep understanding of mechanisms involved in AP-PECVD of MOD inks and promote theelaboration of other new functional metallic thin films.In addition, the PLASMID project will bring to the LIST a strong synthetic chemist from aworld-leading research group. Along her stay, Dr. Knapp will share her widespreadexpertise in the design, synthesis and characterisation of organometallic precursors with theresearchers from the MRT department. The complementary and synergetic expertise of thetwo research groups is foreseen to promote breakthroughs and disruptive innovation in thefield of functional coatings and further strengthen the scientific recognition of the RPTFPgroup. Finally, this secondment is foreseen to be the starting point of future collaborationsbetween the LIST and UCL, paving the way to the submission of high scientific qualityprojects to the FNR and/or Royal Society of United Kingdom.

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